Study on the Stability of Alkaline Silica Sol

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Abstract:

The stability of slurry has a great effect upon the stability of polishing quality. At present the slurry of CMP includes SiO2 is applied in different fields respectively. But silicon sol is not enough to meet the requirement of CMP because of its instability. So the stability of silica sol is studied in this paper. It is known that the rate of coagulation depends mainly on the stability of the colloidal particles and that the solution pH and potential are the main factors affecting the colloidal stability. The stability of dispersion (the ability of the dispersion to resist coagulation) may be related to its kinetic stability, which in turn depends on the force barrier preventing collision between the particles and thus preventing their coagulation. The addition of surfactant can change the pH and the potential of silica sol. So o-20、JFC and PEG are selected to improve the stability of silica sol. The results presented here show that surfactant, PEG with low molecular weight, has a strong consequence on the stability of silica dispersion.

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Periodical:

Advanced Materials Research (Volumes 430-432)

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764-767

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Online since:

January 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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