An Analytical Model for Chemical Etching in One Dimensional Space

Abstract:

In this paper an analytical model for chemical etching in one dimensional space has been presented. Regarding to the special specifications of Ferric chloride, etching of an Aluminum work piece exposed to Ferric chloride etchant has been modeled. The proposed model shows that, in the condition of constant reaction parameters, etching rate is a linear function of time. Excellent agreement between the proposed model and the experimental results, published by Çakır (2008), validates the model. By generalization the proposed model, etching rate, or in the other word depth of etch in a specified time, for different materials with different etchants can be predicted.

• Periodical: Advanced Materials Research (Volume 445)
• Pages: 167-170
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.445.167
• Online since: January 2012
• Authors: Hossein Amirabadi, M. Rakhshkhorshid
• Keywords: Analytical Model, Chemical Etching, Chemical Machining, Depth Of Etch, Etching Rate

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