Research on the Cleaning Technology of Sapphire Substrates Precision Process for LED

Hai Zhou; Li Gang Bei; Yue Zang; Xiao Ming Xu; Zi Guo Zuo

doi:10.4028/www.scientific.net/AMR.452-453.1415

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 452-453Research on the Cleaning Technology of Sapphire...

Research on the Cleaning Technology of Sapphire Substrates Precision Process for LED

Abstract:

The signification of the cleaning of sapphire substrates in precision processing has been presented. The cleaning principles of sapphire substrates have been discussed. The cleaning solution and technology of the sapphire substrates for international production have been presented by cleaning experiments. The size of dust is smaller than 0.13 . The sum of dusts is less than 5 for every substrate. Sapphire substrates can be used in metal organic chemical vapor deposition of GaN without re-cleaning by this method.

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Periodical:

Advanced Materials Research (Volumes 452-453)

Pages:

1415-1419

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.452-453.1415

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Online since:

January 2012

Authors:

Hai Zhou, Li Gang Bei, Yue Zang, Xiao Ming Xu, Zi Guo Zuo

Keywords:

Cleaning Solution, Cleaning Technology, Precision Process, Sapphire Substrates

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References

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