The Key Technology Research for the Microscopic Particles Image Analysis

Hui Sun; Yu Zeng Wang; Ya Lin Li

doi:10.4028/www.scientific.net/AMR.461.677

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 461The Key Technology Research for the Microscopic...

The Key Technology Research for the Microscopic Particles Image Analysis

Abstract:

According to the uneven illumination or the very complex background cases, global threshold value method can't correctly to binary particle image; this paper puts forward a kind of background correction method and the OTSU for particle image binary method. It's used background correction method to eliminate the influence of uneven illumination, and the OTSU for binary particle image. Combining with the above methods are tested, and the result shows that, after the background is corrected, we segment the background brightness particle image; the OTSU can obtain ideal image segmentation effect.

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Periodical:

Advanced Materials Research (Volume 461)

Pages:

677-681

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.461.677

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Online since:

February 2012

Authors:

Hui Sun, Yu Zeng Wang, Ya Lin Li

Keywords:

Binaryzation, Otsu, Uneven Illumination

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