Effect of Deposition Temperature on Surface Roughness of Nanocrystalline Diamond Film

Wen Qi Dai; Lin Jun Wang; Jian Huang; Yi Feng Liu; Ke Tang; Yi Ben Xia

doi:10.4028/www.scientific.net/AMR.476-478.2353

Paper Titles

Soft Magnetic Property of [Fe₈₀Ni₂₀-O/ZnO]_n Multilayer Thin Films for High-Frequency Application
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Analysis of Wet Etching Characteristics of a-IGZO Thin Film
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Effects of Substrate Bias on the Microstructure and Properties of a-C:H Films Deposited by MFPUMST
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Preparation and Characterization of Electrospun Poly (3, 3’5, 5’-Tetramethyl-4, 4’-Diaminodiphenyl-Butyltoluene-Co- 3, 3’, 4, 4’-Biphenyltetracarboxylicdianhydride) Nanofiber Membranes
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Effect of Deposition Temperature on Surface Roughness of Nanocrystalline Diamond Film
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Effects of Pulsed Negative Bias and Current Density on Properties of N-Doped TiO₂ Films Deposited by Arc Ion Plating
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Preparation of Ultra-High Molecular Weight Polyethylene Microporous Membranes via Thermally Induced Phase Separation
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Microstructure and Properties of Laser Clad Nonmagnetic WC-FeNiCr Metal-Matrix Composite Coating
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First-Principles Study of Electronic Structure of V-Si-N Nanocomposite Thin Film
p.2374

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 476-478Effect of Deposition Temperature on Surface...

Effect of Deposition Temperature on Surface Roughness of Nanocrystalline Diamond Film

Abstract:

Nanocrystalline diamond (NCD) films were synthesized by hot-filament chemical vapor deposition (HFCVD) method at different temperatures (600 °C, 620°C, 640°C and 660°C). The AFM and Raman analyses demonstrated that deposition temperature has a great effect on the surface roughness and quality of NCD films and 620°C is the temperature to grow NCD films with smooth surfaces.