Study on Optical Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering

Abstract:

Silicon oxycarbide（SiCO）thin films is a kind of glassy compound materials, which possess many potential excellent properties such as thermal stability, wide energy band, high refractive index and high hardness, and have many potential applications in space. The preparation processes of SiCO thin films by RF magnetron sputtering with different substrate temperature, working pressure and sputtering power were studied. And various surface analysis methods were used to characterize the optical properties of SiCO thin films. The dependence of the properties on the process parameters was also studied. The tested properties of SiCO thin films deposited on K9 glass indicated that lower substrate temperature and sputtering power, higher working pressure could get SiCO thin films with better light penetration and the refractive index of SiCO thin films had a large varying region with the change of the process parameters. With different substrate temperature, working pressure or sputtering power, the maximum refractive index at 633nm（wavelength） are 2.20051, 2.12072 and 1.98959, respectively, and the minimum ones are 1.89426, 1.83176 and 1.8052, respective.

• Periodical: Advanced Materials Research (Volumes 482-484)
• Pages: 1307-1312
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.482-484.1307
• Online since: February 2012
• Authors: Tao Chen, Duo Shu Wang
• Keywords: Optical Performance, RF Magnetron Sputtering, Silicon Oxycarbide, Thin Film

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