Deposition of Transparent AlN Thin Film on SiALON Substrate by Reactive Magnetron Sputtering

Ying Chun Shan; Feng Zhu; Chun Long Guan; Jiu Jun Xu; Liang Wang; Xiao Guang Han

doi:10.4028/www.scientific.net/AMR.503-504.564

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 503-504Deposition of Transparent AlN Thin Film on SiALON...

Deposition of Transparent AlN Thin Film on SiALON Substrate by Reactive Magnetron Sputtering

Abstract:

Aluminum nitride thin film has been deposited on transparent SiAlON substrate by reactive magnetron sputtering. X-ray photoelectron spectroscopy patterns and raman spectra were used to analysis the phase composition of the thin film, and the surface morphology of the thin film was observed by atomic force microscope, which reveal that AlN thin film with smooth surface and columniform microstructure was formed. The fourier transform infrared spectral of the SiAlON substrate and SiAlON/AlN composition structure indicate that the AlN thin film has high transmittance above 99%, it is to say that the AlN thin film is transparent, and it nearly have no affect on the infrared transmittance of the SiAlON substrate.

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Advanced Materials Research (Volumes 503-504)

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564-567

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.503-504.564

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Online since:

April 2012

Authors:

Ying Chun Shan, Feng Zhu, Chun Long Guan, Jiu Jun Xu, Liang Wang, Xiao Guang Han

Keywords:

AlN Thin Films, Reactive Magnetron Sputtering, SiAlON Substrate

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