Microstructure and Mechanical Properties of Ti1-xAlxN Thin Films

C.L. Zhong; P.A. Wei; L.E. Luo

doi:10.4028/www.scientific.net/AMR.534.93

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 534Microstructure and Mechanical Properties of...

Microstructure and Mechanical Properties of Ti_1-xAl_xN Thin Films

Abstract:

A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin films were characterized respectively with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD) and nanoindentor. The effect of Al content on the microstructure and hardness was studied. It was found that Ti1-xAlxN compound thin films exhibits a cubic structure with (1 1 1) preferred orientations and that the lattice parameter of Ti1-xAlxN thin films decrease with the increase of Al content. The hardness of Ti1-x AlxN compound thin films is higher than that of TiN and increases with the increase of Al content. At the heat-treated temperature T = 600 °C, the Ti1-xAlxN thin films is still of high microhardness.