Phase Field Modeling of Multilayer Epitaxial Growth

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Abstract:

We report simulations of multilayer epitaxial growth using a previously proposed continuum phase field model [2, 5]. For island growth in the multilayer regime, this phase-field model reproduces mound structures consistent with experimental images concerned. We focus on the evolution of morphology on multilayer islands under a certain condition. Roughness of epitaxial surface increases rapidly with the coverage increasing when the deposition rate is larger than a critical value. Layer-by- layer growth is the most primary method among the styles of islands growth under low deposition rate. Roughness is independent of temperature, when the temperature is larger than a critical value.

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Periodical:

Advanced Materials Research (Volumes 557-559)

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2396-2400

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Online since:

July 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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