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PVD Preparation Process of (TiN + CrN) / CrAlN Superhard Nanocomposite Multilayer Coatings

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Abstract:

In this study, multi-source multi-target evaporation-sputtering PVD technology to prepare (TiN + CrN) / CrAlN nanocomposite multilayers, accurate modulation of the composition and structure of the coating can effectively reduce the stress in the coating in order to achieve (TiN + CrN) / CrAlN nano-composite multilayer dielectric films optimized design, to reach a good overall performance. (TiN + CrN) / CrAlN superhard nanocomposite multilayer coatings on the surface of tools and molds with carbide and high-speed tool steel materials, followed by the TiN film; (TiN + CrN) film, in the TiN relative content in the layer accounted for 55-65% , CrN relative content for 35-45%; gradient (CrxAl1-x) N-film, x = 0-0.5; structure of TiN / (TiN + CrN) / CrAlN superhardnano-composite multi-layer coating.

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Periodical:

Advanced Materials Research (Volume 568)

Pages:

368-371

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.568.368

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Online since:

September 2012

Authors:

Jun Tian, Zi Qiong Shi

Keywords:

Nano-Composite Multi-Layer, Preparation, PVD Technology

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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