Magnetron Sputtering Applied in Ni-Mn-Ga Films Preparation

Jia Zi Shi; Chuan Zhong Chen; Xing Dang

doi:10.4028/www.scientific.net/AMR.569.7

Paper Titles

Preface, Committees and Sponsors

Fabrication of Superconducting MgB₂-Based Nanocomposites with Magnetic Inclusions by Spark Plasma Sintering
p.3

Magnetron Sputtering Applied in Ni-Mn-Ga Films Preparation
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pH-Induced Cross-Linking of Dopamine-Containing Block Copolymers with Fe³⁺ to Form Self-Healing Hydrogels
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Study on the Morphology Properties of Carbon Nanotube/Polyaniline Composites Thin Film
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Preparation and Catalytic Activity Analysis of TiO₂
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Effect of Wheel Speeds on the Microstructure and Magnetic Properties of Melt-Spun (Nd_0.75,Dy_0.25)_10.5 Zr₂Fe₈₂B_5.5 Ribbons
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Effect of Ge Incorporation on Hydrogenated Amorphous Silicon Germanium Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition
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Construction of High-Quality P-Type ZnSe Nanowires/n-Type Si Heterojunctions and their Nano-Optoelectronic Applications
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 569Magnetron Sputtering Applied in Ni-Mn-Ga Films...

Magnetron Sputtering Applied in Ni-Mn-Ga Films Preparation

Abstract:

Shape memory alloys (SMAs) thin films have attracted much attention in recent years as intelligent and functional materials because of their unique properties. Ferromagnetic shape memory alloys (FSMAs) show large straining output, high impetus and short response time induced by the magnetic field, compared with traditional shape memory alloys. In this paper, Ni-Mn-Ga ferromagnetic shape memory alloys flims prepared by magnetron sputtering are introduced, and the research direction of Ni-Mn-Ga films is presented.

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Periodical:

Advanced Materials Research (Volume 569)

Pages:

7-10

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.569.7

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Online since:

September 2012

Authors:

Jia Zi Shi, Chuan Zhong Chen, Xing Dang

Keywords:

Ferromagnetic Shape Memory Alloys (FSMAs), Magnetron Sputtering, Ni-Mn-Ga Films

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