Synthesis and Characterization of Quaternary Ti-Si-C-N Film Deposited by Middle Frequency Magnetron Sputtering

Jin Long Jiang; Di Chen; Wei Jun Zhu

doi:10.4028/www.scientific.net/AMR.581-582.540

Paper Titles

The Effect of Sintering Temperature on the Mechanism of Metal Composite and Self Toughing and Toughening Si₃N₄ Ceramics Coupling
p.519

The Preparation and Characterization of LiFe_0.98Mn_0.02PO₄/C by Spray-Drying and Low Temperature Reduction Route
p.525

The Preparation Research for IT-SOFC Anode Material LSCM
p.529

The Study of Edge Crack on Hot Strip Steel for CSP
p.533

Synthesis and Characterization of Quaternary Ti-Si-C-N Film Deposited by Middle Frequency Magnetron Sputtering
p.540

Morphology-Controlled Fabrication of CuO Architectures
p.544

Microstructure and Mechanical Properties of Al₂O₃/NiAl In Situ Composites by Hot-Press-Aided Reaction Synthesis
p.548

Effect of the Short Fiber on the NR Composite and the NR-SBR Composite
p.552

Effect of Elements on Characteristics and Structure of Cu-22.7Zn Brass As-Cast
p.556

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 581-582Synthesis and Characterization of Quaternary...

Synthesis and Characterization of Quaternary Ti-Si-C-N Film Deposited by Middle Frequency Magnetron Sputtering

Abstract:

Quaternary Ti-Si-C-N films were deposited Si wafer by middle frequency magnetron sputtering Ti80Si20 twin-targets in mixture atmosphere of Ar, CH4 and N2. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) results indicate that the films present an amorphous structure with no columnar structure. These films are quite uniform and dense without large particles. The film deposited at 10 sccm CH4 and 10 sccm N2 flow rates exhibits a maximum hardness of 18.9 GPa and high elastic recovery of 97%.

You might also be interested in these eBooks

Frontiers of Materials, Chemical and Metallurgical Technologies

View Preview

Info:

Periodical:

Advanced Materials Research (Volumes 581-582)

Pages:

540-543

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.581-582.540

Citation:

Cite this paper

Online since:

October 2012

Authors:

Jin Long Jiang, Di Chen, Wei Jun Zhu

Keywords:

Mf Magnetron Sputtering, Microstructure, Ti-Si-C-N Films

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] Z.G. Li, S. Miyake, M. Makino, Y.X. Wu, Thin Solid Films . 516 (2008) 6548-6552.

Google Scholar

[2] S.Q. Hao, B. Delley, C. Stampfl, Physical Review, B. 74 (2006) 035424.

Google Scholar

[3] L. Rebouta, C.J. Tavares, R. Aimo, et al., Surface and Coatings Technology. 133-134 (2000) 234-239.

Google Scholar

[4] H. C. Barshilia, B. Deepthi, Surface & Coatings Technology. 201 (2006) 329-337.

Google Scholar

[5] S. Ma, J. Procházka, P. Karvánková, et al., Surface & Coatings Technology. 194 (2005) 143-148.

Google Scholar

[6] G.Z. Wu S.L. Ma, Surface Engineering 26(1-2) (2010) 50-54.

Google Scholar

[7] Y. Guo, S. Ma, K. Xu, T. Bell, Nanotechnology. 19(2008) 215603.

Google Scholar

[8] S. Abraham, E.Y. Choi, N. Kang, K.H. Kim, Surface & Coatings Technology. 202 (2007) 915-919.

Google Scholar

[9] C.L. Chang, T. Ju. Hsieh, Journal of Materials Processing Technology. 209 (2009) 5521-5526.

Google Scholar

[10] R.H. Wei, Surface & Coatings Technology. 203 (2008) 538-544.

Google Scholar

[11] Liau Z. L., Mayer J. W., Brown W. L., Poate J. M., Journal of Applied Physics. 49(10) (1978) 5295-5305.

DOI: 10.1063/1.324431

Google Scholar

[12] Y. Taki, Vacuum. 74 (2004) 431-435.

Google Scholar

[13] D. Ma, S. Ma, H.S. Dong, K. Xu, T. Bell, Thin Solid Films . 496 (2006) 438-444.

Google Scholar

[14] J.L. Jiang, J.Y. Hao,P. Wang W.M. Liu, Journal of Applied Physics . 108, 033510 (2010).

Google Scholar