Optimization of Annealing Temperature for PVDF-TrFE (70:30 mol %) Thin Film

Abstract:

The annealing temperature of 250nm PVDF-TrFE (70:30 mol%) spin coated thin films were optimized. The annealing temperature were varies starting from solvent evaporation (T_s), Curies transition (T_c), up to melting temperature (T_m). The result shows that the dielectric constant increases with the increasing of annealing temperature. Supported with the XRD observation indicating there were an improvement in crystallinity consistently with the increasing of the annealing temperature. Morphological properties of the annealed PVDF-TrFE thin films were observed by utilizing Field Emission Scanning Electron Microscope (FESEM) at 100k magnification. It can be found that, the annealing temperature promotes the development of elongated crystallite structure which known as ferroelectric crystal. However, the presence of nanoscale cracks on the thin film annealed at 160°C (AN160, over T_m) suggesting high possibility to posed defects while in device applications.

• Periodical: Advanced Materials Research (Volume 626)
• Pages: 721-726
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.626.721
• Online since: December 2012
• Authors: Mohamad Hafiz Mohd Wahid, Rozana Mohd Dahan, Siti Zaleha Sa'ad, Adillah Nurashikin Arshad, Muhamad Naiman Sarip, Mohamad Rusop Mahmood, Wan Haliza Abd Majid
• Keywords: Annealing, Crystallinity, Dielectric, Morpholoy, PVDF-TrFE

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