Effects of Annealing Treatment on Structural, Optical and Morphology Characteristics of ZnO Nanostructures

Abstract:

The ZnO nanostructure produced by CFCO or French process were undergone annealing treatment at 700°C in oxygen and nitrogen ambient. Subsequently, the characteristics of structural, optical and morphology of ZnO nanostructures were investigated using X-ray diffraction (XRD), photoluminescence (PL) and transmission electron microscopy (TEM) respectively. The crystallite size of the nanostructures were calculated from full width half maximum (FWHM) of (101) peak in XRD patterns and the size is around 42 nm. PL measuremment were carried out and the near band edge emission (NBE) is increase in wavelength or namely redshifted. Moreover, deep band emission (DBE) is observed at 520 nm for ZnO annealed in nitrogen, which commonly regarded as the defect level of oxygen vacancies. The investigation continues with conducting transmission electron microscopy (TEM) to demonstrate the mophology of as grown nanostructures and annealed in both nitrogen and oxygen ambient.

• Periodical: Advanced Materials Research (Volume 626)
• Pages: 967-970
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.626.967
• Online since: December 2012
• Authors: Siti Khadijah Mohd Bakhori, Chuo Ann Ling, Shahrom Mahmud
• Keywords: Photoluminescence (PL), X-Ray Diffraction (XRD), ZnO Nanostructure

References

[1] A. J. Ronovich, D. Golmoya, H. R. Bube; J. Apply. Phys. Vol 51 (1980), p.4260.

[2] V. Srikant, D. R. Clarke: J. Apply. Phys. Vol. 81 (1997), p.6357.

[3] T. Minami, H. Nato, S. A. Takata: Thin Solid Films Vol. 124 (1985), p.43.

[4] R. Hong, J. Huang, H. He, Z. Fan, J. Shao: Apply. Surf. Sci. Vol. 242 (2005), p.346.

[5] S. Mahmud; Journal of Alloys and Compound (2011) Vol. 509 (9) (2011), p.4035.

[6] M. Birkholz, Thin film analysis by X-Ray Scattering, WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim (2006).

[7] K.K. Kim, S. Niki, J. Y. Oh, J. Y. Oh, J. O. Song, T. Y. Seong, S. J. Park, S. Fujita, S. W. Kim; J. Appl. Phys. Vol. 97 (2005), p.066103.

[8] W. Shi, O. Agyeman, C. N. Xu, Enhancement of the light emissions from zinc oxide films by controlling the post-treatment ambient; J. Appl. Phys. Vol. 91 (2002), p.5640.

DOI: 10.1063/1.1466527

[9] E.S. Shim, H.S. Kang, S.S. Pang, J.S. Kang, I. Yun, S.Y. Lee; Materials Science and Engineering Vol. B102 (2003), p.366.

[10] Z. K. Tang, Q. K. L. Wong, P. Yu; Apply. Phys. Lett. Vol. 72 (1998), p.3270.

[11] K. Haga, T. Suzuki, Y. Kashiwaba, H. Watanabe, B. P. Zhang, Y. Segawa; Thin Solid Films Vol. 433 (2003) p.131.

DOI: 10.1016/s0040-6090(03)00327-4

[12] T. B. Hur, G.S. Jeen, Y. H. Hwang, H.K. Kim ; J. Appl. Phys. Vol. 94 (2003), p.5787.