Effect of Oxygen Incorporation on the Properties of AlF3 Films

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Abstract:

In order to reveal the influence of oxidization on the properties of AlF3 films, single layers of AlF3 were deposited at different substrate temperature by thermo evaporation technique with or without oxygen injected into the coating chamber. The chemical composition, total stress, optical properties and laser damage resistance of samples were characterized. Comparative study indicates the AlF3 films prepared under higher oxygen pressure have more oxides which result from hydration process in atmosphere. The presence of oxides also reduces total stress and optical absorption of the fluoride coatings.

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Advanced Materials Research (Volumes 631-632)

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121-126

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January 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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[1] J. Ullmann, M. Mertin, H. Lauth, Coated optics for DUV excimer laser application, Proceedings of SPIE2000, pp.514-527.

Google Scholar

[2] M. Zukic, D.G. Torr, J.F. Spann, M.R. Torr, Vacuum Ultraviolet Thin-Films . 1. Optical-Constants of Baf2, Caf2, Laf3, Mgf2, Al2o3, Hfo2, and Sio2 Thin-Films, Appl Optics, 29 (1990) 4284-4292.

DOI: 10.1364/ao.29.004284

Google Scholar

[3] T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Owadano, Y. Matsumoto, M. Yano, Highly Damage-Resistant Reflectors for 248-Nm Formed by Fluorides Multilayers, Laser-Induced Damage in Optical Materials : 1990, 1441 (1991) 339-344.

DOI: 10.1520/stp23641s

Google Scholar

[4] R. Chow, M.R. Kozlowski, G.E. Loomis, Damage thresholds of fluoride multilayers at 355 nm, Proceedings of SPIE1992, pp.312-321.

Google Scholar

[5] J. Dijon, E. Quesnel, B. Rolland, P. Garrec, C. Pelle, J. Hue, High damage threshold fluoride UV mirrors made by Ion beans sputtering, Laser-Induced Damage in Optical Materials: 1997, Proceedings, 3244 (1998) 406-416.

DOI: 10.1117/12.306989

Google Scholar

[6] D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation, Appl Optics, 41 (2002).

DOI: 10.1364/ao.41.003196

Google Scholar

[7] H. Yu, Y. Shen, Y. Cui, H. Qi, J. Shao, Z. Fan, Characterization of LaF3 coatings prepared at different temperatures and rates, Applied Surface Science, 254 (2008) 1783-1788.

DOI: 10.1016/j.apsusc.2007.07.143

Google Scholar

[8] G. Liu, H. Yu, W. Zhang, Y. Jin, H. He, Z. Fan, Comparison study of microstructure, chemical composition and optical properties between resistive heating and electron beam evaporated LaF3 thin films, Thin Solid Films, 519 (2011) 3487-3491.

DOI: 10.1016/j.tsf.2011.01.084

Google Scholar

[9] P.J. Martin, R.P. Netterfield, Ion-Assisted Deposition of Magnesium Fluoride Films on Substrates at Ambient-Temperatures, Appl Optics, 24 (1985) 1732-1733.

DOI: 10.1364/ao.24.1732_1

Google Scholar

[10] P.J. Martin, W.G. Sainty, R.P. Netterfield, D.R. Mckenzie, D.J.H. Cockayne, S.H. Sie, O.R. Wood, H.G. Craighead, Influence of Ion Assistance on the Optical-Properties of Mgf2, Appl Optics, 26 (1987) 1235-1239.

DOI: 10.1364/ao.26.001235

Google Scholar

[11] J. D., Targove, L. J., Lingg, J. P., Lehan, H.A. Macleod, Effect of oxygen incorporation on the structure of ion-beam-assisted LaF3 thin films, Appl Optics, 27 213-215.

DOI: 10.1364/ao.27.000213

Google Scholar

[12] J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, J. -C. Birolleau, Polishing-induced contamination of fused silica optics and laser induced damage density at 351nm, Optics Express, 13 (2005) 10163-10171.

DOI: 10.1364/opex.13.010163

Google Scholar

[13] G. Hu, S. Shao, M. Yang, J. Shao, Y. Zhao, K. Yi, Z. Fan, Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings, (2009) 75040D-75040D-75047.

DOI: 10.1117/12.836189

Google Scholar

[14] G.G. Stoney, The tension of metallic films deposited by electrolysis, P R Soc Lond a-Conta, 82 (1909) 172-175.

Google Scholar

[15] R. Swanepoel, Determination of the Thickness and Optical-Constants of Amorphous-Silicon, J Phys E Sci Instrum, 16 (1983) 1214-1222.

DOI: 10.1088/0022-3735/16/12/023

Google Scholar

[16] H.A. Macleod, Thin-Film Optical Filters, 3rd ed., Institute of Physics Publishing, Brisol, London, (2001).

Google Scholar

[17] L. Dumas, E. Quesnel, J.Y. Robic, Y. Pauleau, Characterization of magnesium fluoride thin films deposited by direct electron beam evaporation, J Vac Sci Technol A, 18 (2000) 465-469.

DOI: 10.1116/1.582210

Google Scholar