Fabrication of Anti-Reflecting Silicon Surfaces for Solar Cells Using Ag Assisted Chemical Etching

Abstract:

Antireflection of silicon surface is one key technology for manufacture of efficient solar cells. The noble metal assisted chemical etching Si wafer can quickly produce a black Si surface with a high porosity in HF-H₂O₂-H₂O solution at room temperature. The pores formed are straight and vertical to the surface of Si. The porous Si surface exhibits a reflectivity of 2 % in the range of 200-1000 nm, which shows that this process is beneficial to improve the conversion efficiency and to decrease the cost of Si solar cells.

• Periodical: Advanced Materials Research (Volumes 631-632)
• Pages: 717-720
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.631-632.717
• Online since: January 2013
• Authors: Chun Lin He, Xue Fei Yang, Guo Feng Ma, Jian Ming Wang, Zhao Fu Du, Dong Liang Zhao, Qing Kui Cai
• Keywords: Antireflection, Metal Assisted Chemical Etching, Si

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