Synthesis of Silicon Thin Film by Electrodeposition from Ionic Liquid

Abstract:

The synthesis of a silicon thin film by room-temperature electrodeposition was investigated in the ionic liquids 1-ethyl-3-methyl-imidazolium bis(trifluoromethylsulfonyl)imide ([EMIM]Tf₂N) and 1-butyl-3-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide ([BMPy]Tf₂N) with SiCl₄. Cyclic voltammetry on a gold working electrode showed the possibility of the electrodeposition of elemental silicon. The reduction current of silicon in [EMIM]Tf₂N was higher than in [BMPy]Tf₂N. The elemental silicon thin film could be synthesized on the gold electrode under potentiostatic conditions, as confirmed by various analytical techniques including X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy with energy-dispersive spectroscopy. In the [EMIM]Tf₂N electrolyte with dissolved SiCl₄, the electrodeposited Si surface was more uniform than in [BMPy]Tf₂N and no impurity was detected except trace oxygen caused by contamination during handling for analysis

• Periodical: Advanced Materials Research (Volume 650)
• Pages: 145-149
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.650.145
• Online since: January 2013
• Authors: Je Sik Park, Jae Jun Park, Kyung Jung Kwon, Han Su Kim, Churl Kyoung Lee
• Keywords: Nonaqueous Electrolyte, Room-Temperature Electrolysis, Silicon, Thin Film

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