Effect of Two-Step Deposition Process on Morphology and Optical Properties of Nanostructured Diamond Films

S. Tipawan Khlayboonme; Wicharn Techitdheera; Warawoot Thowladda

doi:10.4028/www.scientific.net/AMR.651.148

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 651Effect of Two-Step Deposition Process on...

Effect of Two-Step Deposition Process on Morphology and Optical Properties of Nanostructured Diamond Films

Abstract:

The morphology and optical properties of nanostructured diamond films affected by the two-step deposition process with changing CH₄ concentration were investigated. The CH₄ concentration was 1% for the first step and 2% for the second step. The films were prepared by chemical vapor deposition in a microwave plasma reactor with a CH₄/H₂ gas mixture. Nanocrystalline columnar-structured diamond film with lowering of sp²-bonded carbon content was achieved by the two-step deposition process. Unlike that of the single-step process with 1%CH₄, the two-step process promoted the morphology to more uniform and smoother film. The two-step process increased the higher grain boundary as well as decreased the sp²-bonded carbon content in the film, as compared with the single-step process with 2%CH4_{Subscript text}.

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Periodical:

Advanced Materials Research (Volume 651)

Pages:

148-153

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.651.148

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Online since:

January 2013

Authors:

S. Tipawan Khlayboonme, Wicharn Techitdheera, Warawoot Thowladda

Keywords:

Nanostructured Diamond Films, Raman Spectroscopy, Reflectometry, Two-Step Process

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