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Characteristics of BiFeO3 Thin Films on a LaAlO3 Substrate by RF Sputtering

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Abstract:

In this paper, BiFeO3 (BFO) films were grown on LaAlO3 (LAO) substrate by a RF magnetron sputtering system. Fabrication parameters, such as work pressure, sputtering atmosphere, and post annealing were examined in terms of their influences on characteristics of the ferroelectric films. X-Ray diffraction, Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films. At last, the ferroelectric characteristic of BFO has been studied, and the film has a large saturated polarization of 40 μC / cm2 under an applied field of 12 kV /cm.

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Periodical:

Advanced Materials Research (Volume 683)

Pages:

64-68

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.683.64

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Online since:

April 2013

Authors:

Jian Cao, Jie Xing, Bin He, Zi Yang Zhang, Yan Ting Duan, Jiang Fan Gu

Keywords:

BiFeO3, Ferroelectric, Thin Film

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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