Effect of High Repetition Pulsed Laser Annealing on Optical Properties of Phosphorus Ion-Implanted ZnO Nanorods

Abstract:

We report on the effect of high repetition pulsed laser annealing with a KrF excimer laser on the optical properties of phosphorus ion-implanted ZnO nanorods. The recovery levels of phosphorus ion-implanted ZnO nanorods have been measured by photoluminescence spectra and cathode luminescence (CL) images. After ion implantation on the surface of ZnO nanorods, CL was disappeared over 400 nm below the surface due to the damage caused by ion implantation. When the annealing was performed at a low repetition, CL was recovered only shallow area below the surface. The depth of the annealed area was increased with the repetition rate of the annealing laser. By optimizing the annealing conditions such as the repetition rate, the irradiation fluence and so on, we have succeeded to anneal the whole damaged area over 400 nm in depth and to observe CL. Thus, the effectiveness of high repetition pulsed laser annealing on phosphorus ion-implanted ZnO nanorods was demonstrated.

• Periodical: Advanced Materials Research (Volume 699)
• Pages: 383-386
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.699.383
• Online since: May 2013
• Authors: Tetsuya Shimogaki, Taihei Ofuji, Norihiro Tetsuyama, Kota Okazaki, Mitsuhiro Higashihata, Daisuke Nakamura, Hiroshi Ikenoue, Tanemasa Asano, Tatsuo Okada
• Keywords: High Repetition Laser, Ion Implantation, Laser Annealing, Nanostructure, ZNO

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