Electrochromicproperties of Vanadium Oxide Thin Film Deposited by Magnetron Sputtering

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Vanadium oxide films were deposited on ITO (Indium Tin oxide) glass substrates at room temperature byreactive DC magnetron sputtering.The Vanadium oxide films were varied the nitrogen flow rateto investigate composition, microstructure, optical properties, and electrochromic properties determined by X-ray diffraction, field-emission scanning electron microscope (FE-SEM), UV-visible spectrometer, andcyclic voltammetry. Experimental results indicatedthat V2O5filmsreactively sputtered at oxygen flow rates of 15 sccm had better electrochromic property and optimalperformance.

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40-43

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July 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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[1] M.S. Whittinham: J. Electrochem. Soc. Vol. 123 (1976), p.315

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