The Effect of Thickness on the Properties of TGZO Thin Films for Optoelectronic Devices

Abstract:

Titanium and gallium co-doped zinc oxide (TGZO) thin films with highly (002)-preferred orientation were grown on glass substrates by magnetron sputtering. The effect of thickness on structure and optical properties of the deposited films were investigated by X-ray diffractometer and spectrophotometer. The results show that the polycrystalline TGZO films consist of the hexagonal crystal structures with c-axis as the preferred growth orientation normal to the substrate, and that the thickness significantly affects the crystal structure and optical properties of the thin films. It is observed that the average transmitance in the wavelength range of the visible spectrum decreases with the increase of thickness. The TGZO thin film with about 900 nm thickness exhibits the maximum grain size, the lowest dislocation density and the minimum micro strain.

• Periodical: Advanced Materials Research (Volumes 734-737)
• Pages: 2124-2127
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.734-737.2124
• Online since: August 2013
• Authors: T. Zhang, H. Wang, Z.Y. Zhong, C.Y. Yang
• Keywords: Microstructure, Optical Property, TGZO Thin Films

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DOI: 10.1007/s10854-013-1202-6