Effect of Heat Treatment on High Purity Nanoporous Silica Formed from Volcanic Ash Deposit Shirasu

Abstract:

High purity nanoporous silica was fabricated using Shirasu a volcanic ash as a starting material. The starting materials were melted at 1400°C. A mother glass was formed by quenching the melt in pure water. Leaching was performed by immersing the mother glass into an HCl solution. Nonsilica phases formed by phase separation in the mother glass were leached out with acid solution. The obtained porous silica was more than 99% pure and had pore size smaller than 2 nm. In order to control the pore size, post heat treatment was performed. The treatment temperature was varied from 540 to 600°C for 12 h. The treatment time was varied from 6 to 12 hours at 600°C. The pore size was controlled from 3.1 to 23.4 nm with changing temperature and time for the post heat treatment.

• Periodical: Advanced Materials Research (Volume 747)
• Pages: 547-550
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.747.547
• Online since: August 2013
• Authors: Kosei Sato, Toshinori Kokubu, Kensuke Nishioka
• Keywords: High Purity, Nanoporous Silica, Phase Separation, Pore Size, Volcanic Ash

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