High Density Formation of Iron Nanodots on SiO2 Induced by Remote Hydrogen Plasma

Hai Zhang; Ryo Fukuoka; Yuuki Kabeya; Katsunori Makihara; Seiichi Miyazaki

doi:10.4028/www.scientific.net/AMR.750-752.1011

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 750-752High Density Formation of Iron Nanodots on SiO2...

High Density Formation of Iron Nanodots on SiO₂ Induced by Remote Hydrogen Plasma

Abstract:

We have successfully formed Fe-nanodots with an areal dot density as high as ~2.4×10¹¹ cm^-2 on thermally grown SiO₂ by exposing a 3-nm-thick Fe layer to a remote plasma of pure H₂ without external heating. During remote H₂ plasma exposure, the surface temperature rising up to ~500 °C was caused by surface recombination of atomic H, which enhanced surface migration of Fe atoms and promoted self-assembling nanodots. Electrical separation among Fe-nanodots was also verified from the changes in surface potential after charge injection using an AFM/Kelvin probe technique. The magnetic characterization by using magnetic force microscopy suggests that Fe-nanodots act as not only charge storage nodes but also spin-dependent active elements.

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Advanced Materials Research (Volumes 750-752)

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1011-1015

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https://doi.org/10.4028/www.scientific.net/AMR.750-752.1011

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August 2013

Authors:

Hai Zhang, Ryo Fukuoka, Yuuki Kabeya, Katsunori Makihara, Seiichi Miyazaki

Keywords:

Iron Nanodots, Remote Hydrogen Plasma

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