Research on Image Seam-Line Removing Based on Illumination Correction

Wen Bang Sun; Hai Yan Tang; Hong Tao Wang; Yan Chang

doi:10.4028/www.scientific.net/AMR.756-759.3889

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 756-759Research on Image Seam-Line Removing Based on...

Research on Image Seam-Line Removing Based on Illumination Correction

Abstract:

Nowadays, the hard correction is a familiar method for image seam-line removing. But the method needs accurate gray difference around the seam-line which is difficult to achieve occasionally. To overcome such drawbacks, a novel seam-line removing method was proposed in the paper. First, optimal texture matching blocks beside the seam-line are searched, and the average gray level of the two blocks can be obtained. Then, the average gray level of the two blocks is adjusted to estimate the gray level of the same target in different illumination environment. Finally, the illumination is corrected based on the average gray level to remove the seam-line. The theoretical analysis and experiment results show that the proposed method is more effectual then traditional methods.

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Periodical:

Advanced Materials Research (Volumes 756-759)

Pages:

3889-3893

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.756-759.3889

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Online since:

September 2013

Authors:

Wen Bang Sun, Hai Yan Tang, Hong Tao Wang, Yan Chang

Keywords:

Block Matching (BM), Hard Correction, Illumination Correction, Seam-Line Removing

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