Polishing of Nickel Cylinder Using a Photocatalyst and Fluorescent Substance Excited by an Ultraviolet Ray

Abstract:

This study targets the development of a polishing technique that uses a photocatalyst and a fluorescent substance excited by an ultraviolet ray. Nickel (hereafter referred to as Ni) was polished chemically and mechanically at the micrometer level under ultraviolet-ray irradiation. Measurements clarified that TiO2 of 0.1-μm grain size, at which size the excitation by the ultraviolet ray was less influential, mechanically polished the Ni. Cathilon (a luminous dye) chemically polishes Ni. The corrosion of the Ni surface became large under ultraviolet-ray excitation. A flat surface was attained on the Ni by chemical and mechanical polishing using both the TiO2 and cathilon, when was irradiated by an ultraviolet ray.

• Periodical: Advanced Materials Research (Volumes 76-78)
• Pages: 337-342
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.76-78.337
• Online since: June 2009
• Authors: Takeshi Tanaka
• Keywords: Electron, Fluorescent Substance, Hole, Metal Surface Treatment, Nickel, Photocatalytic, Polishing, Quantum Chemistry, Ultraviolet-Ray Exciting

References

[1] T. Ohyoshi, Y. Isono and T. Tanaka: Proceeding of JSPE Kansai District (1999), p.31 (in Japanese).

[2] Y. Chiwaya and T. Tanaka: Key Engineering Materials, Vol. 291-292 (2005), p.343.

[3] A. Fujishima, K. Hashimoto and T. Watanabe: Photocatalyst Mechanism, Nihon Jitsugyou Publisher (2004), p.115 (in Japanese).

[4] K. Takeuch, S. Murasawa and T. Sijyuku: World of Photocatalyst, Kougyouchousakai Publisher (1998), p.31 (in Japanese).

[5] Y. Chiwaya and T. Tanaka: Journal of JSPE, Vol. 73, 4 (2007), p.444 (in Japanese).

[6] K. Hashimoto and A. Fujishima: New Trend of TiO2 Photocatalyst, CMC Publisher (2005), p.45 (in Japanese).

[7] Y. Chiwaya and T. Tanaka: Journal of JSAT, Vol. 51, 4 (2007), p.232 (in Japanese). Fig. 13 Schematic diagram of ultraviolet-ray aided machinig.