Influence of Vacuum Cathodic Arc Etching on Structure and Properties of W-Doped DLC Films

Zhi Qiang Fu; Cheng Biao Wang; Wen Yue; Zhi Jian Peng; Song Sheng Lin; Ming Jiang Dai

doi:10.4028/www.scientific.net/AMR.787.296

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 787Influence of Vacuum Cathodic Arc Etching on...

Influence of Vacuum Cathodic Arc Etching on Structure and Properties of W-Doped DLC Films

Abstract:

In order to further improve the deposition process of the W-doped DLC films synthesized by a hybrid deposition method of vacuum cathodic arc, ion beam deposition, and magnetron sputtering, the paper studied the effect of vacuum cathodic arc etching prior to the deposition on the surface morphology, chemical bond status, hardness, elastic modulus, adhesion, friction, and wear of the films. It was found that the surface defects in the W-doped DLC films, which increase the average value and fluctuation of the friction coefficient of the W-doped DLC films, are mainly produced by vacuum cathodic arc etching. The adhesion and wear resistance of the W-doped DLC films can be obviously improved by arc etching while arc etching has an unobvious effect on the chemical bonding status, hardness, and elastic modulus of the W-doped DLC films.

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Periodical:

Advanced Materials Research (Volume 787)

Pages:

296-300

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.787.296

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Online since:

September 2013

Authors:

Zhi Qiang Fu, Cheng Biao Wang, Wen Yue, Zhi Jian Peng, Song Sheng Lin, Ming Jiang Dai

Keywords:

Hybrid Deposition, Surface Defect, Vacuum Cathodic Arc Etching, W-Doped DLC Films

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