An Investigation on Surface Sol-Gel Silica Film

Abstract:

Ultrathin silica films were grown on polyimide substrates using surface sol-gel method and the film growth process was characterized by ellipsometry, atomic force microscopy, X-ray photoelectron spectroscopy, Fourier transformed infrared spectroscopy. The polyimide substrates were pretreated by chemical process for promoting the growth of silica film. On the modified polymide surface, the growth of silica films shows an island-like growth type, but not a lay-by-lay process. Moreover, the deposited silica films are not a strict SiO₂ film.

• Periodical: Advanced Materials Research (Volume 787)
• Pages: 65-70
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.787.65
• Online since: September 2013
• Authors: Xin Zhang, Lei Mao, Jing Ma
• Keywords: Silica Film, Structure Characterization, Surface Sol-Gel

References

[1] Y. Leterrier: Prog. Mater. Sci. Vol. 48 (2003), p.1.

[2] D. Rats, V. Hajek and L. Martinu: Thin Solid Films Vol. 340 (1999), p.33.

[3] Ch. Bichler, T. Kerbstadt, H.C. Langowski and U. Moosheimer: Surf. Coat. Technol. Vol. 112 (1999), p.373.

[4] C. Bichler, T. Kerbstadt, H.C. Langowski and U. Moosheimer: Surf. Coat. Technol. Vol. 97 (1997), p.299.

[5] K. Teshima, Y. Inoue, H. Sugimura and O. Takai: Thin Solid Films Vol. 420/421 (2002), p.324.

DOI: 10.1016/s0040-6090(02)00847-7

[6] G. Dennler, A. Houdayer, M. Latreche, Y. Segui and M.R. Wertheimer: Thin Solid Films Vol. 382 (2001), p.1.

[7] A.G. Erlat and R.J. Spontak: J. Phy. Chem. B Vol. 103 (1999), p.6047.

[8] N.I. Kovtyukhova, E.V. Buzaneva, C.C. Waraksa, B.R. Martin and T.E. Mallouk: Chem. Mater. Vol. 12 (2000), p.383.

DOI: 10.1021/cm990395p

[9] I. Ichinose, H. Senzu and T. Kunitake: Chem. Lett. Vol. 25 (1996), p.831.

[10] I. Ichinose, H. Senzu and T. Kunitake: Chem. Mater. Vol. 9 (1997), p.1296.

[11] J.H. Fendler and F.C. Meldrum: Adv. Mater. Vol. 7 (1995), p.607.

[12] A.P. Alivisatos: MRS Bull Vol. 23 (1998), p.18.

[13] X. Zhang, Y.Y. Wu and S.Y. He: Hebei Ind. Sci. Technol. Vol. 27 (2010), p.149.

[14] G. Socrates, in: Infrared Characteristic Group Frequencies, second edited by Wiley, Chichester (1994), p.188.

[15] G. Lucovsky, C.K. Wong and W.B. Pollard: J. Non-Cryst. Solids Vol. 59/60 (1983), p.839.

[16] C.D. Wagner, A.V. Naumkin and A. Kraut-Vass, in: NIST X-ray photoelectron spectroscopy database. NIST Standard Reference Reference Database 20, Version 3. 4 (Web Version).

DOI: 10.6028/nist.tn.1289

[17] A. Killinger, C. Thummler, M. Grunze and W. Schrepp: J. Adhes. Vol. 36 (1992), p.229.

[18] C.L. Mirley and J.T. Koberstein: Langmuir Vol. 11 (1995), p.1049.

[19] S. Takeda, M. Fukawa, Y. Hayashi and K. Matsumoto: Thin Solid Films Vol. 339 (1999), p.220.

[20] W.J. Stec, W.E. Morgan and R.G. Albridge: Inorg. Chem. Vol. 11 (1972), p.219.

[21] H.B. Li, R.K. Sharma, Y. Zhang, A.A.O. Tay, E.T. Kang and K. G: Langmuir Vol. 19 (2003), p.6845.

[22] D. Kim and Y.R. Shen: Appl. Phys. Lett. Vol. 74 (1999), p.3314.

[23] N.C. Stoffel, M. Hsieh, S. Chandra and E. J. Kramer: Chem. Mater. Vol. 8 (1996), p.1035.

[24] O. Sneh, M.L. Wise, A.W. Ott, L.A. Okada and S.M. George: Surf. Sci. Vol. 334 (1995), p.135.

[25] J.W. Klaus, A.W. Ott, J.M. Johnson and S.M. George: Appl. Phys. Lett. Vol. 70 (1997), p.1092.