Substrate Temperature Dependence on Sputtered Titania Thin Film

Abstract:

Titania films were deposited on glass substrates by RF magnetron sputtering method at different substrate temperatures which are room temperature, 50°C, 100°C, 150°C, 200°C, 250°C and 300°C. The surface morphology and cross section of the particles structure were studied using Field Emission Scanning Electron Microscope. It is shown that the increase in substrate temperature during the sputtering process up to 300°C will make the film become more dense and grown in a columnar structure. Significant changes occur on the titania thin film structure at 250°C due to the significant changes in the surface thermal energy and the surface diffusion.

• Periodical: Advanced Materials Research (Volume 795)
• Pages: 294-298
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.795.294
• Online since: September 2013
• Authors: Zainuddin Aznilinda, Sukreen Hana Herman, A.B. Raudah, W.F.H. Abdullah, M. Rusop
• Keywords: Nanostructure, Sputtering, Substrate Temperature, TiO₂, Titania

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