Study on Dual-Plane Ball Polishing Method for Finishing Ceramics Ball

Abstract:

This paper represents a dual-plane polishing method for ceramics ball. Compared with traditional ball polishing method, its upper and lower plate are all flat and easy to use soft pad to polish, so it can largely reduce the surface mechanical damage and obtain high quality processing surface. This paper analyzes surface polishing trajectory by calculation and simulation to test the polishing trajectory uniformity. A mathematics model of polishing process is established to disintegrate the process of a balls movement. Experiment is operated in dual-plane planetary polishing machine. The result shows that perfect polishing surface and spherical error can be obtained under the proper process parameters, the surface roughness achieves 4nm and the spherical error can reach 0.217μm.

• Periodical: Advanced Materials Research (Volume 797)
• Pages: 444-449
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.797.444
• Online since: September 2013
• Authors: Kai Ping Feng, Zhao Zhong Zhou, Bing Hai Lv, Ju Long Yuan
• Keywords: Ceramics Ball, Dual-Plane Polishing, Polishing Trajectory

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