Study on Impurities Removal from Silicon by Slag Refining with Fe (OH)3-SiO2-CaF2 Slag System

Cheng Hao Lu; Ming Fang; Hui Xian Lai; Liu Qing Huang; Juan Chen; Yu Qing Chen; Jin Tang Li; Wen Hui Ma; Zhi Lin Sheng; Xue Tao Luo

doi:10.4028/www.scientific.net/AMR.815.733

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 815Study on Impurities Removal from Silicon by Slag...

Study on Impurities Removal from Silicon by Slag Refining with Fe (OH)₃-SiO₂-CaF₂ Slag System

Abstract:

An innovating slag system, Fe (OH)₃-SiO₂-CaF₂ system, was introduced in the metallurgical methods to purify silicon for photovoltaic application. The partition ratio of boron (L_B) between slag and silicon was studied under different mass ratio of slag to silicon and varying mass ratio of Fe (OH)₃ to SiO₂ under argon condition at 1873K. The distribution of impurity elements in silicon after slag refining was detected by scanning electron scope and electron probe micro analysis. Experimental results illustrated that the Fe-Si binary system could promote the L_B. Silicon was surrounded by amorphous slag. Impurity elements are concentrated in slag.

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Progress in Materials Science and Engineering: ICMSE 2013

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Periodical:

Advanced Materials Research (Volume 815)

Pages:

733-737

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.815.733

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Online since:

October 2013

Authors:

Cheng Hao Lu, Ming Fang, Hui Xian Lai, Liu Qing Huang, Juan Chen, Yu Qing Chen, Jin Tang Li, Wen Hui Ma, Zhi Lin Sheng, Xue Tao Luo

Keywords:

Boron Removal, Impurities Distribution, Metallurgical-Grade Silicon, Partition Ratio, Slag Refining

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