Technological Study of ZnO Thin Film Preparation by Sol-Gel Method

Yu Fang; Tan Li

doi:10.4028/www.scientific.net/AMR.846-847.1915

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 846-847Technological Study of ZnO Thin Film Preparation...

Technological Study of ZnO Thin Film Preparation by Sol-Gel Method

Abstract:

In recent years, the development of thin film materials has been applying widely in various fields. ZnO has many advantages Compared with GaN, which is based on wide band gap semiconductor material and also the most successful technology currently. ZnO is a kind of thin film materials with development potential in high technology field and civil field. Based on the current study of functional thin film materials, this paper introduces the main physical method of preparation in ZnO thin film, focusing on method of ZnO thin films preparation by sol-gel, and summarizes.

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Periodical:

Advanced Materials Research (Volumes 846-847)

Pages:

1915-1918

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.846-847.1915

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Online since:

November 2013

Authors:

Yu Fang*, Tan Li

Keywords:

Preparation Method, Sol-Gel Method, ZnO Thin Film

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