Thickness Dependence of Structural and Optical Properties of Al/ZnO Films Prepared by DC Magnetron Sputtering

Zohreh Ghorannevis; Marzieh Asadi Milani; Maryam Habibi; Mahmood Ghoranneviss

doi:10.4028/www.scientific.net/AMR.856.193

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 856Thickness Dependence of Structural and Optical...

Thickness Dependence of Structural and Optical Properties of Al/ZnO Films Prepared by DC Magnetron Sputtering

Abstract:

In this paper, AZO thin films of different thicknesses were deposited on glass substrates as transparent conducting (TCO) films by changing the deposition time using a DC magnetron sputtering method. The effect of film thicknesses on the structural and optical properties of AZO films was investigated using X-ray diffractometer (XRD) and spectrophotometer, respectively. Results show that increasing the film thickness results in decreasing the optical transmittance. The optimum properties were obtained for a film with 500 nm thickness and 90 min deposition time, which exhibited a transmittance of 95%.

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Periodical:

Advanced Materials Research (Volume 856)

Pages:

193-196

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.856.193

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Online since:

December 2013

Authors:

Zohreh Ghorannevis, Marzieh Asadi Milani, Maryam Habibi, Mahmood Ghoranneviss

Keywords:

Sputtering, Thin Film, Transparent Conducting Oxide

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References

[1] G. G. Untila, T. N. Kost, A. B. Chebotareva, M. B. Zaks, A. M. Sitnikov and O. I. Solodukha: Semiconductors Vol. 42 (2008), p.406. (Springer, New York 2010).

DOI: 10.1134/s1063782608040076

Google Scholar

[2] N. Ohta, D. Ohba, S. Sato, Z. Tang, H. Shimizu and H. Shirai: Thin Solid Films Vol. 519 (2011), p.6920.

DOI: 10.1016/j.tsf.2011.04.043

Google Scholar

[3] W. T. Yen, Y. C. Lin, P. C. Yao, J. H. Ke and Y. L. Chen: Thin Solid Films Vol. 518 (2011), p.3882.

Google Scholar

[4] O. Vigil, F. Cruz, G. Santana, L. Vaillant, A. Morales-Acevedo and G. Contreras-Puente: Appl Surf Sci. Vol. 161 (2007), p.27.

Google Scholar

[5] PJ. Kelly, RD. Arnell: Vacuum Vol. 56 (2007), p.159.

Google Scholar

[6] H. Ko, WP. Tai, KC. Kim, SH. Kim, SJ. Suh and YS. Kim: J. Cryst Growth Vol. 277 (2005) p.352.

Google Scholar

[7] M. Suchea, S. Christoulakis, N. Katsarakis, T. Kitsopoulos and G. Kiriakidis: Thin Solid Films Vol. 515 (2007), p.6562.

DOI: 10.1016/j.tsf.2006.11.151

Google Scholar

[8] J. Tauc, R. Grigorovici, and A. Vancu: Phys. Stat. Sol. Vol. 15, (1996), p.627.

Google Scholar