Very Broad Metal Ion Beam Source for Ion Implantation and Coating Deposition Technologies

Abstract:

The paper describes high broad metal ion source based on dc macroparticle filtered vacuum arc plasma generation with the dc ion-beam extraction. The possibility of formation of pseudo ribbon beam of metal ions with the parameters: ion beam length 0.6 m, ion current up to 0.2 A, accelerating voltage 40 kV, and ion energy up to 160 kV has been demonstrated. The pseudo ribbon ion beam is formed from dc driven vacuum arc plasma. The results of investigation of the vacuum arc evaporator ion-emission properties are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ion-emission properties of vacuum-arc discharge for different cathode materials are determined. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 Gs on the cathode surface.

• Periodical: Advanced Materials Research (Volume 880)
• Pages: 288-291
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.880.288
• Online since: January 2014
• Authors: Igor Stepanov*, Alexander Ryabchikov, Denis Sivin
• Keywords: Cathodes, Ion Sources, Plasma Guns, Plasma Production, Vacuum-Arc

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