Transparent and Conductive Fluorinated-Tin Oxide Prepared by Atmospheric Deposition Technique

Agus Purwanto

doi:10.4028/www.scientific.net/AMR.896.24

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 896Transparent and Conductive Fluorinated-Tin Oxide...

Transparent and Conductive Fluorinated-Tin Oxide Prepared by Atmospheric Deposition Technique

Abstract:

Fluorinated tin oxide (FTO) is well known transparent conductive oxide which is widely applied for optoelectronic applications. Commercially, high-performance (FTO) film was fabricated by sputtering method or other low pressure methods. The product of these methods is expensive due to the high price of capital cost for the apparatus. To cut the price of FTO, atmospheric condition methods were developed and actively investigated using a simple device. By controlling the process conditions; such as processing temperature, precursor concentration, doping concentration, and reactor configuration; high performance FTO glass was successfully produced. The sheet resistance of the prepared FTO glass can be controlled from 9.55 – 63 Ω/□. In addition, its transparency is approximately 77 % which is ideal characteristics for the dye sensitized solar cell (DSSC) electrode application.

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Periodical:

Advanced Materials Research (Volume 896)

Pages:

24-28

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.896.24

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Online since:

February 2014

Authors:

Agus Purwanto*

Keywords:

Atmospheric, Deposition, FTO, Sheet Resistance, Transparent

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