Experimental and Simulation Study of Magnetron Sputtering MgO Film Thickness Distribution

Ya Ping Han; Jing Yan Feng; Qiang Fu; Fan Da Zeng; Guan Wang

doi:10.4028/www.scientific.net/AMR.900.401

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 900Experimental and Simulation Study of Magnetron...

Experimental and Simulation Study of Magnetron Sputtering MgO Film Thickness Distribution

Abstract:

A physical model of magnetron sputtering process was built, the distribution of MgO film thickness on the substrate was deduced, and the data were analyzed by using the Matlab. nanosized MgO thin film was prepared on Si substrate by magnetron sputtering. SGC-10 was used to measure the thickness of MgO thin film. The results of experiment correspond fairly well with the theory. Both experiment and the theory show that the distribution of the film thickness on the substrate is uneven and it is also influenced by the radius as well as the distance between the target and substrate. The physical model provides a theoretical basis for evaluation and estimation of the film thickness.

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Periodical:

Advanced Materials Research (Volume 900)

Pages:

401-404

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.900.401

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Online since:

February 2014

Authors:

Ya Ping Han, Jing Yan Feng, Qiang Fu, Fan Da Zeng, Guan Wang

Keywords:

Film Thickness Distribution, Magnetron Sputtering, MATLAB Simulation, Nanosized MgO Film, Physical Model

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