Thermal Behavior of AlTiN Free-Standing Coating by Cathodic Arc Deposition

Po Yi Tsou; Wei Yu Ho; Yen Shuo Chang; Guo Kai Jiang; Chien Ju Chiu; Cheng Liang Lin

doi:10.4028/www.scientific.net/AMR.900.538

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 900Thermal Behavior of AlTiN Free-Standing Coating by...

Thermal Behavior of AlTiN Free-Standing Coating by Cathodic Arc Deposition

Abstract:

(Ti,Al)N coatings possess superior hardness, good thermal and chemical stability. To further study the oxidation resistance, the arc-deposited AlTiN bulk material was collected from the substrate shutter of a commercial coating system deposited for over 100 batches. The thermal behaviour of the materials was studied by TGA/DSC with different annealing temperature or different atmospheres. The results show that AlTiN bulk material annealed in nitrogen exhibits the denser structure and thermal stability up to 1000°C. The oxidation resistance of the AlTiN can reach to 800°C. Annealed at 600 ~ 700°C proceed the recrystallization process which denser the structure. New phase of TiO₂ is formed by incorporate oxygen in exchange of nitrogen. nanoscaled 1D wire formation occurred at the 1000°C for 3 hours in air.

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Periodical:

Advanced Materials Research (Volume 900)

Pages:

538-542

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.900.538

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Online since:

February 2014

Authors:

Po Yi Tsou, Wei Yu Ho*, Yen Shuo Chang, Guo Kai Jiang, Chien Ju Chiu, Cheng Liang Lin

Keywords:

AlTiN Coating, Cathodic Arc Deposition, Thermal Stability

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