The Influences of Process Parameters on Properties of CrNx Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering

Xiang Min Xu; Hao Zhang; Yi Bin Jin; Hao Chen Zhang; Shu Wang Duo

doi:10.4028/www.scientific.net/AMR.908.38

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 908The Influences of Process Parameters on Properties...

The Influences of Process Parameters on Properties of CrN_xCoatings Deposited by Closed Field Unbalanced Magnetron Sputtering

Abstract:

CrN_xcoatings were prepared by closed filed unbalanced magnetron sputtering (CFUMS), and the effects of N₂ flux ratio and bias voltage on CrN coatings were investigated. Results showed that the phase in coatings was the coexistence of CrN, Cr₂N and Cr, and CrN(111) always showed an intensive preferred orientation in both cases, but CrN(200) enhanced with the rise of bias voltage. The hardness of coatings decreased with an increasing N₂ flux ratio, while improved with an increasing bias voltage. The grain edges were polished off and the boundaries became blurred when higher bias voltage was applied. All in all, the surface morphologies of CrN coatings became flatter and denser with both increasing N₂content and bias voltage, respectively.

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Periodical:

Advanced Materials Research (Volume 908)

Pages:

38-41

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.908.38

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Online since:

March 2014

Authors:

Xiang Min Xu, Hao Zhang, Yi Bin Jin, Hao Chen Zhang, Shu Wang Duo*

Keywords:

Bias Voltage, CFUMS, CrN Coating, Influence, N₂ Flux Ratio

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