Experimental Investigation of Fabrication of Double Tapered Hole Array by Using Electroforming and Mask Electrochemical Machining

Xiao Hui Bao; Ping Mei Ming; Zhen Bin Lv

doi:10.4028/www.scientific.net/AMR.941-944.2140

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 941-944Experimental Investigation of Fabrication of...

Experimental Investigation of Fabrication of Double Tapered Hole Array by Using Electroforming and Mask Electrochemical Machining

Abstract:

Basing on an inert perforated metal mask, a hybrid electrochemical fabrication combining electroforming and mask electrochemical machining was proposed to manufacture metal through-hole array with double tapered openings. The feasibility of this novel process was investigated experimentally. The effects of pattern parameters of inert metal mask, such as wall angle, α, substrate thickness, H, hole spacing, L and hole size, D, on profiles of the resulting holes were analyzed. The experimental results show that the hybrid fabrication is able to manufacture high-aspect-ratio double tapered hole array with good surface quality.

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Periodical:

Advanced Materials Research (Volumes 941-944)

Pages:

2140-2144

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.941-944.2140

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Online since:

June 2014

Authors:

Xiao Hui Bao, Ping Mei Ming*, Zhen Bin Lv

Keywords:

Electroforming, Inert Metal Mask, Mask Electrochemical Machining, Tapered Hole Array

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