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The Research of N/C-Codoped TiO2 Films Deposited by Arc Ion Plating
Abstract:
The N/C co-doped TiO2 thin films were successfully deposited on medical glass slide by pulsed negative bias arc ion plating. The influence of pulsed negative bias, annealing temperature on films properties was investigated. Film structure, surface morphologies and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. The results show that the most absorption edges of the as-deposited films increase with the rising of the pulse negative bias, and the maximum of 540 nm is achieved under-600V bias. The films absorption edges increase in different degree after annealing at 400°Cfor 2h and 4h, and the best extension can increase 46nm after annealing. The interaction of the annealing treatment and bias functions enhance the N and C reaction activities and extend absorption edge. The greatest absorption edge dater of the co-doped TiO2 films under the negative pulse bias for 0V can reach 550nm after the annealing at 400°Cfor 2h. The crystal morphology become inconspicuously with the bias increasing from 0V to-300V, which is corresponding to the XRD result, the anatase diffraction peaks weaken obviously.
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55-58
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May 2014
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© 2014 Trans Tech Publications Ltd. All Rights Reserved
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