Influence of Sputtering Power on Structural and Optical Properties of Ta2O5 Thin Films Prepared by DC Reactive Magnetron Sputtering

Narong Sangwaranatee; Mati Horprathum; Jakrapong Kaewkhao

doi:10.4028/www.scientific.net/AMR.979.431

Paper Titles

Photo and X-Rays Induced Optical Luminescence of Sm³⁺-Doped Bismuth Borate Glasses
p.413

Temperature Difference of Thermoelectric Module on PIC-Microcontroller
p.417

The Study of Cook-Stove Thermoelectric Generator Power
p.421

Design of Commercial Window as Radiation Shielding Using Domestic Raw Materials
p.426

Influence of Sputtering Power on Structural and Optical Properties of Ta₂O₅ Thin Films Prepared by DC Reactive Magnetron Sputtering
p.431

Characterization of Calcium Hydroxide Derived from Waste Eggshell upon Moisture Effect
p.435

Physical and Chemical Properties of Mineral in Soils of Cassava Cropping Area: A Case Study in Chonburi Province
p.440

Physical and Chemical Properties of Mineral in Soils of Paddy Rice Fields from Chonburi Province, Thailand
p.444

Effect of O₂ Flow Rate on Structural and Optical Properties of Tantalum Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering
p.448

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 979Influence of Sputtering Power on Structural and...

Influence of Sputtering Power on Structural and Optical Properties of Ta₂O₅ Thin Films Prepared by DC Reactive Magnetron Sputtering

Abstract:

In this article, amorphous tantalum oxide thin films were deposited by dc reactive magnetron sputtering onto silicon (001) wafer and glass slide substrates. Sputtering power has been varied for optimizing thin film quality. The structural and optical properties of the Ta₂O₅ thin films were investigated by using X-ray diffraction, UV-Vis spectrophotometer and spectroscopic ellipsometry respectively. The XRD pattern result indicates that the films are amorphous. It was found that the growth rate was also increased with increasing dc power up to 250 W, and the maximum growth rate observed at 250 W was 0.25 nm/s. In addition, the refractive index and packing density of the films increases with increasing dc sputtering power.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 979)

Pages:

431-434

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.979.431

Citation:

Cite this paper

Online since:

June 2014

Authors:

Narong Sangwaranatee*, Mati Horprathum, Jakrapong Kaewkhao

Keywords:

Optical Property, Sputtering Power, Tantalum Oxide

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] F. Rubio, J.M. Albella, J. Denis, J.M. Martinez-Duart, Optical properties of reactively sputtered Ta2O5 films, J. Vac. Sci. Technol., 21 (1982)1043.

DOI: 10.1116/1.571862

Google Scholar

[2] S. -C. Wang, K. -Y. Liu, J. -La. Huang, Tantalum oxide film prepared by reactive magnetron sputtering deposition for all-solid-state electrochromic device, Thin Solid Films 520 (2011) 1454-1459.

DOI: 10.1016/j.tsf.2011.08.046

Google Scholar

[3] K. Jagadeesh Kumar, N. Ravi Chandra Raju, A. Subrahmanyam, Properties of pulsed reactive DC magnetron sputtered tantalum oxide (Ta2O5) thin films for photocatalysis, Surface and Coatings Technology 205 (2011) 261-264.

DOI: 10.1016/j.surfcoat.2011.03.052

Google Scholar

[4] S. J. Wu, B. Houng, and B. Huang, Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method, J. Alloys Compd. 475 (2009) 488–493.

DOI: 10.1016/j.jallcom.2008.07.126

Google Scholar