Effect of O2 Flow Rate on Structural and Optical Properties of Tantalum Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

Narong Sangwaranatee; Mati Horprathum; Jakrapong Kaewkhao

doi:10.4028/www.scientific.net/AMR.979.448

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Influence of Sputtering Power on Structural and Optical Properties of Ta₂O₅ Thin Films Prepared by DC Reactive Magnetron Sputtering
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 979Effect of O2 Flow Rate on Structural and Optical...

Effect of O₂ Flow Rate on Structural and Optical Properties of Tantalum Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

Abstract:

Tantalum oxide (Ta₂O₅) thin films have been deposited on glass substrates and silicon wafers (100) by dc reactive magnetron sputtering and with a 99.995% pure tantalum target. The effect of the oxygen flow rate on the crystallinity and optical properties were investigated. The films were characterized by X-ray diffraction patterns, UV-Vis spectrophotometer and spectroscopic ellipsometry. The results show that the deposition rate of Ta₂O₅ thin films was decreased with the increase in oxygen flow rate. In addition, Ta₂O₅ thin films deposited at oxygen flow rate higher than 6 sccm could be exhibited sufficiently oxide thin film, the transmittance spectrum percentage indicated 80%, which corresponded to the obtained optical characteristic.

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Periodical:

Advanced Materials Research (Volume 979)

Pages:

448-451

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.979.448

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Online since:

June 2014

Authors:

Narong Sangwaranatee*, Mati Horprathum, Jakrapong Kaewkhao

Keywords:

DC Magnetron Sputtering, O₂ Flow Rate, Tantalum Oxide

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