Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition

Agnieszka Twardowska; Bogusław Rajchel; Lucyna Jaworska

doi:10.4028/www.scientific.net/AST.66.11

Paper Titles

Preface

Committees

3-D Static and Time-Depending Modelling of DC and RF Thermal Plasmas for Industrial Applications
p.1

Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition
p.11

A Comparison between Conventional Thermal Treatment and Excimer Laser Irradiation Performed on Alumina/PEEK Composite Coatings
p.17

Application of SEM/TEM to Tests on Pt Distribution in Al₂O₃ Films Obtained by Oxidising FeCrAl Steel Foil Coated with Pt-Al Nanofilms
p.23

A Chemometric Study of Alumina/PEEK and Hydroxyapatite/PEEK Suspensions Prepared for Electrophoretic Deposition of Multifunctional Coatings
p.29

Effect of Methane Flow Rate on the Microstructural and Mechanical Properties of Silicon Carbide Thin Films Deposited by Reactive DC Magnetron Sputtering
p.35

ESR Study of Elements Added-DLC Films Deposited by PBII and RF-CVD Methods
p.41

HomeAdvances in Science and TechnologyAdvances in Science and Technology Vol. 66Ti–Si–C Films Formed by Dual Beam Ion Assisted...

Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition

Abstract:

Ti–Si–C coatings were formed at room temperature on AISI 316L steel substrates by dual beam ion assisted deposition technique from single compound Ti3SiC2 target. Scanning and transmission electron microcopy method were used to examine as-deposited coatings. Their morphology was smooth and dense and their thickness were in the range from 100 nm to 1μm. Raman spectra of coated substrates were collected up with five peaks at the same positions as for Ti3SiC2 compound target. TEM and HRTEM examinations, accompanied by SAED analyses revealed that deposited films were amorphous. Nanoindentation tests were provided on coated and uncoated substrates and hardness HIT and reduced elastic modulus EIT were calculated using the Oliver & Pharr method.