Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition

Abstract:

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Ti–Si–C coatings were formed at room temperature on AISI 316L steel substrates by dual beam ion assisted deposition technique from single compound Ti3SiC2 target. Scanning and transmission electron microcopy method were used to examine as-deposited coatings. Their morphology was smooth and dense and their thickness were in the range from 100 nm to 1μm. Raman spectra of coated substrates were collected up with five peaks at the same positions as for Ti3SiC2 compound target. TEM and HRTEM examinations, accompanied by SAED analyses revealed that deposited films were amorphous. Nanoindentation tests were provided on coated and uncoated substrates and hardness HIT and reduced elastic modulus EIT were calculated using the Oliver & Pharr method.

Info:

Periodical:

Edited by:

Pietro VINCENZINI and Ghislain MONTAVON

Pages:

11-16

DOI:

10.4028/www.scientific.net/AST.66.11

Citation:

A. Twardowska et al., "Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition", Advances in Science and Technology, Vol. 66, pp. 11-16, 2010

Online since:

October 2010

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Price:

$35.00

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