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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 131-132Interstitial Defect Reactions in Silicion: The...

Interstitial Defect Reactions in Silicion: The Case of Copper

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Defect and Diffusion Forum Vols. 131-132

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Periodical:

Defect and Diffusion Forum (Volumes 131-132)

Pages:

89-0

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.131-132.89

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Online since:

March 1996

Authors:

A. Mesli, T. Heiser

Keywords:

Defect, Diffusion, Electrical Characterisation, Metallic Impurity, Metastability, Pairing

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Сopyright:

© 1996 Trans Tech Publications Ltd. All Rights Reserved

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