Interstitial Defect Reactions in Silicion: The Case of Copper

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Periodical:

Defect and Diffusion Forum (Volumes 131-132)

Pages:

89-0

DOI:

10.4028/www.scientific.net/DDF.131-132.89

Citation:

A. Mesli and T. Heiser, "Interstitial Defect Reactions in Silicion: The Case of Copper", Defect and Diffusion Forum, Vols. 131-132, pp. 89-0, 1996

Online since:

March 1996

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$35.00

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