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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Diffusion Barriers in Semiconductor Contact...

Diffusion Barriers in Semiconductor Contact Technology

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

1271-1284

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.1271

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Cite this paper

Online since:

January 1997

Authors:

M.-A. Nicolet

Keywords:

Amorphous Conducting Films, Diffusion Barrier, Metal/Semiconductor Contact, Ternary Nitrides

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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