Paper Titles

Regularities in Changes of the Activation Energy for Self- and Impurity Diffusion in Alkali Halides on Passing Through the Melting Point
p.1265

Diffusion Barriers in Semiconductor Contact Technology
p.1271

Evaluation of Sputtered Tungsten as Diffusion Barrier Materials for Copper
p.1285

Investigation of Barrier Properties of TiB₂ Protective Layer for SiC/C Ti Alloy Composites
p.1291

Silicide Islands Formation and Diffusion Processes during Solid-State Reaction of Metallic Glasses Thin Films with Single Crystalline Silicon Substrates
p.1297

Ion Current Dependent Interdiffusion in Au-Al Layers during Ion Beam Irradiation
p.1303

First Study of a Diffusion Mechanism with Synchrotron Radiation
p.1311

Diffusion-Induced β-NMR Relaxation in Single-Crystal Lithium
p.1317

Study of Fast Grain Boundary Diffusion in Mixed Conducting Compounds by Impedance Spectroscopy
p.1323

HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Silicide Islands Formation and Diffusion Processes...

Silicide Islands Formation and Diffusion Processes during Solid-State Reaction of Metallic Glasses Thin Films with Single Crystalline Silicon Substrates

Article Preview

Abstract:

You might also be interested in these eBooks

Diffusion in Materials DIMAT 1996

Info:

Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

1297-1302

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.1297

Citation:

Cite this paper

Online since:

January 1997

Authors:

N.V. Rozhanskii, V.O. Lifshits

Keywords:

Metallic Glass, Silicide, Silicon, Solid-State

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1997 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: