Visible Photoluminescence from Germanium-Implanted Silicon Oxynitride Films after Annealing under Hydrostatic Pressure

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Periodical:

Defect and Diffusion Forum (Volumes 186-187)

Edited by:

D.J. Fisher

Pages:

71-78

DOI:

10.4028/www.scientific.net/DDF.186-187.71

Citation:

I. E. Tyschenko et al., "Visible Photoluminescence from Germanium-Implanted Silicon Oxynitride Films after Annealing under Hydrostatic Pressure", Defect and Diffusion Forum, Vols. 186-187, pp. 71-78, 2000

Online since:

December 2000

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$35.00

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