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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Reaction Diffusion in the Au-Ti System between...

Reaction Diffusion in the Au-Ti System between 1110K and 1150K

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

1569-1574

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.1569

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Online since:

April 2001

Authors:

Osamu Taguchi, Tomoni Watanobe, Yoshihiro Yamazaki, Yoshiaki Iijima

Keywords:

Au-Ti System, Intermetallic Compound (IMC), Phase Layer Growth, Reaction-Diffusion

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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