Reaction Diffusion in the Au-Ti System between 1110K and 1150K

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

1569-1574

DOI:

10.4028/www.scientific.net/DDF.194-199.1569

Citation:

O. Taguchi et al., "Reaction Diffusion in the Au-Ti System between 1110K and 1150K", Defect and Diffusion Forum, Vols. 194-199, pp. 1569-1574, 2001

Online since:

April 2001

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$35.00

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