This book covers, on close to 2000 pages, all aspects of basic and applied diffusion research in all important engineering materials, including metals and intermetallics, elemental and compound semiconductors, amorphous and nanocrystalline materials and oxides.
Volume is indexed by Thomson Reuters CPCI-S (WoS)

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eBook:

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ToC:

Table of contents

Editors:

Y. Limoge and J.L. Bocquet

DOI:

https://doi.org/10.4028/b-Sv5oP3

THEMA:

TGM

BISAC:

TEC021000

Keywords:

Diffusion, Diffusion Mechanism, Grain Boundary, Grain Boundary Diffusion, Interdiffusion, Intermetallic, Point Defect, Self-Diffusion, Tracer Diffusion, Vacancy

Details:

Int. Conf. on Diffusion in Materials, Paris, France, July 17-21, 2000

Pages:

1940

Year:

2001

ISBN-13 (hardcover):

9783908450603

ISBN-13 (CD):

9783035709193

ISBN-13 (eBook):

9783035707038

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