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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 206-207Modelling Investigation of Boron Diffusion in...

Modelling Investigation of Boron Diffusion in Polycrystalline HfO₂ Films

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Defects and Diffusion in Ceramics IV

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Periodical:

Defect and Diffusion Forum (Volumes 206-207)

Pages:

123-130

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.206-207.123

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Online since:

July 2002

Authors:

Chun Li Liu

Keywords:

Ab Initio Modeling, B Diffusion, Polycrystalline Oxide, Thin Film

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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