Modelling Investigation of Boron Diffusion in Polycrystalline HfO2 Films

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Periodical:

Defect and Diffusion Forum (Volumes 206-207)

Edited by:

D.J. Fisher

Pages:

123-130

DOI:

10.4028/www.scientific.net/DDF.206-207.123

Citation:

C. L. Liu "Modelling Investigation of Boron Diffusion in Polycrystalline HfO2 Films", Defect and Diffusion Forum, Vols. 206-207, pp. 123-130, 2002

Online since:

July 2002

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